Products
Specifications
| Model | MPE-510 |
| Dimensions | System dimensions：1200 mm (W) ×800 mm (D) ×1800 mm (H) Weight：Approx.300kg Chamber dimensions：420 mm (W) ×510 mm (D) ×386.5 mm (H) |
| Stage |
5axes（X, Y, Z, θx, θy） Stage Travel：X=40 mm, Y=130 mm, Z=10 mm θx, θy=±1° Stage Resolution：X, Y, Z≦5μm θx, θy≦0.1° |
| Sample Size | Package：14 mm, 20 mm, 24 mm Chip：6.5 mm, 10 mm, 15 mm |
| Process gases | CF4 (0.1 MPa) , N2 (0.2 MPa) , D.A (0.5 MPa) |
| Vacuum pump | Scroll pump (250 L) |
| Plasma gun | RF power 50 W Capillary diameter :0.5 mm - 4 mm Capillary material : alumina |
| Target materials | Si, SiO2, W, Ti, Ta, PIQ, SiN |
Applications
1.Local deprocessing of LSI’s
2.Preprocessing for FIB milling
3.Other local plasma processing Local
Examples
Local delaying of a PIQ passivation layer
LSI deprocessing
